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> Aq 3000 waterborne photoresist (voc free)
Aq 3000 waterborne photoresist (voc free)
AQ 3000 is the world's first waterborne photoresist. VOC Free and User- Friendly, this photoresist is the best choice for etching PCBs, microelectronics, MEMs and other devices. This negative acting photoresist is also excellent for photochemical machining of Stainless Steel, Copper, Brass, Aluminum and other metals. AQ 3000 performs well in all acidic environments and surpasses solvent based liquid photoresists in performance and ease of use. AQ 3000 is available for dip coating, rollercoating, spraying, screen printing and spin coating. Develops quickly in Potassium or Sodium Carbonate.
* Sub 1 Mil Features Possible
* Super Fast Exposures to 15 mJ
* Waterborne, User Friendly, No Solvent Smell
* Surpasses Dry Film Adhesion to All Metals
* Cleans Up in Soap and Water, No Solvents
* Significant Savings Compared to Dry Film
(special filtration and other packaging sizes please contact us)
Phone: 330.920.8550 Fax: 330.920.8551
*Formerly distributed by Advanced Coatings International. All rights now owned by GENESIS Material Technology. Same product, same performance!
