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> High-resolution large-field uv microlithography lens
High-resolution large-field uv microlithography lens
High-resolution, large-field, UV projection microlithography lens
Description: This unit-magnification, long-conjugate projection lens was originally built for a high-resolution Laser Projection Imaging Microlithography System using 351 nm XeF excimer laser. The projection lens unit magnification can be manually varied by 5000 ppm using an on-board mechanical stage. The double-telecentricity provides distortion-free, diffraction-limited imaging over the entire field of view of 50 mm diameter. The lens is corrected and built to provide 10 micron resolution over the entire depth of focus of 560 microns. The large-field lens is provided with a kinematic mount for easy alignment to the rest of the system and is ideal for both bridge-type and breadboard-type of configurations in R&D applications.
* Resolution: 10 microns (diffraction-limited over entire FOV)
* Design Wavelength: 351-353 nm
* Special Feature: Doubly telecentric
